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链式酸抛光清洗设备

设备名称 Equipment Name

链式酸抛光清洗设备  Inline Acid Polishing Equipment

设备型号 Equipment Model

SC-LSP4500/ SC-LSP8000

设备用途 Equipment Application

对单、多晶硅片进行刻蚀/抛光、清洗、干燥。
Etching/polishing, cleaning and drying of mono/multi crystalline solar cells.

工艺流程 Process Flow

正面保护→刻蚀/抛光→碱洗→酸洗→烘干
Water layer protection→Etching/Polishing→Alkaline cleaning→Acid Cleaning→Drying.

技术特点  Features

1. 高产能:4500PCS/5道,8000PCS/10道。
High Throughput: 4000pcs/h, 5 lanes; 8000pcs/h, 10 lanes.

2. 高均匀性,超长药液寿命。
Excellent Uniformity, long bath life time.

3. 支持多种添加剂或混合添加剂技术。
Various additives or mixed additives technology.

4. 支持最薄120μm硅片。
Wafer thickness down to 120μm.

5. 快速换液,在线换液。
Quick inline bath change.

6. 持背面抛光工艺,超低药耗。
Suitable for rear side polishing and with low chemical consumption.

7. 持MES,选配在线称重检测。
Suitable with MES ; Inline weight testing is optional.

8. 兼容酸抛光功能。
Compatible with acid polish function.

设备参数  Parameters